Textured Thick Films of Bi2Sr2Ca1Cu2Ox

Oxygen etching of thick MoS2 films.

Oxygen annealing of thick MoS2 films results in randomly oriented and controllable triangular etched shapes, forming pits with uniform etching angles. These etching morphologies differ across the sample based on the defect sites situated on the basal plane surface, forming numerous features in different bulk sample thicknesses.

Self-Poling of BiFeO3 Thick Films.

Bismuth ferrite (BiFeO3) is difficult to pole because of the combination of its high coercive field and high electrical conductivity. This problem is particularly pronounced in thick films. The poling, however, must be performed to achieve a large macroscopic piezoelectric response. This study presents evidence of a prominent and reproducible self-poling effect in few-tens-of-micrometer-thick B...

Piezoelectric Thick Films: Preparation and Characterization

Residual stress analysis in thick uranium films

Residual stress analysis was performed on thick, 1–25 lm, depleted uranium (DU) films deposited on an Al substrate by magnetron sputtering. Two distinct characterization techniques were used to measure substrate curvature before and after deposition. Stress evaluation was performed using the Benabdi/Roche equation, which is based on beam theory of a bi-layer material. The residual stress evolut...

Relaxor-ferroelectric PMN–PT Thick Films

Electroceramic thick films are 2D (planar) structures that, in their simplest form, consist of a substrate, a bottom electrode, a ceramic film and a top electrode, with the thickness of an individual layer being typically between 1 and 100 μm. The processing of thick films is similar to the processing of bulk ceramics, i.e., it involves powder synthesis, shaping and sintering. The major differe...